What is hard lithography?
Lithography, which is also called optical lithography or UV lithography, is a process used in microfabrication to pattern parts of a thin film or the bulk of a substrate. It uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical “photoresist”, or simply “resist,” on the substrate.
What is photoresist lithography?
A photoresist (also known simply as a resist) is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronic industry.
What is lithography resolution?
Resolution is a fundamental measure of the capability of a lithography process. By applying the rigorous definition of resolution given here, resolution can be measured and used to quantify the impact of processes changes (such as changing the numerical aperture) or for comparing different processes.
What is DUV and EUV?
– DUV: Deep ultraviolet, a wavelength range in the far ultraviolet. Chip production uses 248 and 193 nanometres. – EUV: Extreme ultraviolet, the wavelength range between roughly 100 and 10 nanometres.
What resolution is possible with optical lithography?
However, the traditional photolithography is inherently limited by the wave length of the light used and the typical resolution obtained in laboratories can go down to 100 nm. With deep ultraviolet light it is possible to fabricate the feature sizes down to 50 nm.
How do I increase the resolution of a photolithography?
To increase resolution: reduce and k1, increase NA; But this also reduces depth of focus (a bigger issue for lithography). For a slit, the diffraction has a dark fringe when sin=m/d, m=1,2… and d is slit width.
What are the different types of lithography What is optical lithography?
6.2. There are different types of lithography, including photolithography, electron beam lithography, ion beam lithography and X-ray lithography.
How do you develop a photoresist?
Photoresist processing, or simply resist processing, basically consists of six steps: 1) dehydration and priming; 2) resist coating; 3) soft baking; 4) exposure; 5) development; and 6) post-development inspection.
How is photoresist applied?
Spin coating is the most common method for applying photoresist to a substrate surface. Other less common methods include spraying, roller coating, dip coating and extrusion coating.
How many types of lithography technologies are there?
Overview. There are different types of lithographic methods, depending on the radiation used for exposure: optical lithography (photolithography), electron beam lithography, x-ray lithography and ion beam lithography.